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plasma time

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  • Plasma stealth — is a proposed process that uses ionized gas (plasma) to reduce the radar cross section (RCS) of an aircraft. Interactions between electromagnetic radiation and ionized gas have been extensively studied for a variety of purposes, including the… …   Wikipedia

  • Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

  • Plasma diagnostics — are experimental techniques used to measure properties of a plasma such as temperature and density. Langmuir probe Measurements with electric probes, called Langmuir probes, are the oldest and most often used procedures for low temperature… …   Wikipedia

  • Plasma source — Plasma sources generate plasmas. Excitation of a plasma requires partial ionization of neutral atoms and/or molecules of a medium. There are several ways to cause ionization:collisions of energetic particles, strong electric fields acting on bond …   Wikipedia

  • Plasma oscillation — Plasma oscillations, also known as Langmuir waves (after Irving Langmuir), are rapid oscillations of the electron density in conducting media such as plasmas or metals. The frequency only depends weakly on the wavelength. The quasiparticle… …   Wikipedia

  • Plasma recombination — is a process by which ions of a plasma capture the free energetic electrons to form new neutral atoms.Recombination usually take place in the whole volume of a plasma (volume recombination), although in some cases it is confined to some special… …   Wikipedia

  • Plasma activation — (or plasma functionalization). It is done with the intent to alter or improve adhesion properties of surfaces prior to coating, painting, etc. In most cases, the surface in question is surface of a polymer material and weakly ionised oxygen… …   Wikipedia

  • Plasma Enhanced Chemical Vapour Deposition — Plasma Enhanced Chemical Vapour Deposition, PECVD or sometimes PCVD, is the process by which chemicals are deposited onto a substrate using a Radio Frequency (RF) Plasma to split the precursors into active ions.TheoryPrecursor chemical enter the… …   Wikipedia

  • Time UK — is a computer retailer set up by the people behind the failed Time Computer Systems.The company is based within the main factory offices at Time Technology Park in Simonstone, near Burnley in Lancashire. The company specializes in providing… …   Wikipedia

  • Time Commando — es un videojuego de acción aventura con escenario en distintas épocas de la historia humana. Contenido 1 Historia 2 Niveles 3 Objetos 4 Armamento …   Wikipedia Español

  • Plasma-unterstütztes Ätzen — (physikalisch chemisches Ätzen) bezeichnet eine Gruppe von subtraktiven (abtragenden) Mikrostrukturverfahren in der Halbleitertechnologie. Als Trockenätzverfahren stellen sie alternative Strukturierungsverfahren zum sog. Nassätzen (nasschemischen …   Deutsch Wikipedia

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